Curriculum Vitae

Thierry Djenizian

18.07.1972

Nationality: French

Vierzigmannstr. 24

Tel: + 49 9131 852 7587

D-91054 Erlangen

Fax: + 49 9131 852 7582

Germany

e-mail: thierry@ww.uni-erlangen.de

PhD in Materials Science

At Swiss Federal Institute of Technology Lausanne, EPFL (Switzerland) and

at the University of Erlangen-Nuremberg (Germany)

Diploma thesis in Materials  Science, at Swiss Federal Institute of Technology Lausanne, EPFL (Switzerland)

M. Sc. in Physical chemistry option Materials Science, University of Marseille (France)

B. Sc. in Physics and Chemistry, University of Marseille (France)

Maturity Certificate in Science, Institute J. Monnet, Vitrolles (France)

PhD of materials science at Materials Science Department of the Swiss Federal Institute of Technology Lausanne (CH) and at the Chair for Surface Science and Corrosion at the University of Erlangen-Nuremberg (D).

Subject: "Electron beam induced carbon deposit used as mask for selective electrochemical reactions onto semi-conductive electrodes."

Methods: Scanning Electron microscopy (observation and patterning of surfaces), Electrodeposition, capacitance measurements, micro-electrochemistry, Ellipsometry, AES and XPS, AFM and photolithography. 

06/2001-07/2002

Collaboration with the Institute of Microstructural Sciences (IMS) of the National Research Council of Canada (NRC-Ottawa)

Subject: formation and properties of anodic oxide grown on InP

Diploma thesis Materials Science Department of the Swiss Federal Institute of Technology Lausanne (EPFL), Physical Metallurgy Laboratory, Lausanne (CH).

Subject: "Electromagnetic plasma enhanced diamond-like carbon deposition"

Keywords: Thin film, micro-Raman spectroscopy, SEM, IR spectroscopy.

Semester project in the Center of thermodynamic and calorimmetry, CNRS, Marseille.

Subject:" Formation and characterization of porous aluminum oxide".

Training course in industry during 6 weeks at SNMI in Avignon (France).

Subject: Optimization of sputtered zirconium oxide deposition for nuclear applications

Lab. Courses for undergraduate students in Materials Science.

Lithography and fabrication of MOS transistor.

Characterization of MOS transistor.

Lab. Courses for undergraduate students in Materials Science.

Corrosion of materials.

Tutoring for thermodynamics lecture, undergraduate students.

Tutoring for electrochemistry lecture, undergraduate students.

L. Achour, E-beam induced masking for metallic nanostructures formation.

K. Khairoun, E-beam induced masking for selective pore formation

on silicon surface.

B. Petite, Selective electrodeposition of CdS at semi-conductive electrodes.

C. Blachon, E-beam induced carbon deposition for selective

electrodeposition of Cu at semi-conductive electrodes.

K. Belghiti, E-beam induced carbon nanomasking for nanostructures

formation on metal .

D. Favez, E-beam induced carbon nanomasking on silicon surface.

C. Barraud, Nano-patterning by selective electrochemical deposition of CdSe

onto AFM modified silicon surfaces.

P. Beaud, AFM induced nano-patterning of Si surfaces.

Methods: SEM lithography (observation, patterning of surfaces), selective electrodeposition of various metals, polymers and semiconductors on semiconductive and metallic surfaces. Selective pore formation on

silicon surface.

Pore formation and oxidation of InP, electrical characterization.

Nano-patterning by selective electrochemical deposition onto AFM modified

silicon surfaces.

T. Djenizian, L. Santinacci and P. Schmuki

" Localized Electrochemical Deposition of Au into E-beam patterns" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, 198^th Meeting of the Electrochem. Soc., Phoenix, October 2000.

L. Santinacci, T. Djenizian and P. Schmuki

"AFM induced nanopatterning of Si surfaces" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, 198^th Meeting of the Electrochem. Soc., Phoenix, October 2000.

P. Schmuki, L. Santinacci, T. Djenizian and D.J. Lockwood

"Pore formation on InP and GaAs" in 2^nd international Conference on Porous Semiconductor Science and Technology, Madrid, march 2000.

P. Schmuki, L. Santinacci, T. Djenizian and D.J. Lockwood

"Formation and properties of porous InP" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, 198^th Meeting of the Electrochem. Soc., Phoenix, October 2000. 

D.J. Lockwood, L. Santinacci, T. Djenizian and P. Schmuki

"Optical properties of InP" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, 198^th Meeting of the Electrochem. Soc., Phoenix, October 2000.

T. Djenizian, L. Achour, L. Santinacci and P. Schmuki

"Electron-Beam Induced Carbon Nano-masking for Selective Electrodeposition of Metals on Si(100)" in Electrochemical Deposition and Dissolution, Joint International Meeting: 200^th ECS meeting and the 52^nd ISE meeting, San Francisco, September 2001.

T. Djenizian, L. Santinacci and P. Schmuki

"Electron Beam Induced Carbon Masking for Selective Porous Silicon formation" in 6^th International symposium on the physics and chemistry of luminescent materials Joint International Meeting: 200^th ECS and the 52^nd ISE, San Francisco, September 2001.

T. Djenizian, B. Petite, L. Santinacci and P. Schmuki

"Electron-Beam Induced Carbon Patterns Used as Mask for the Cadmium Sulfide Deposition on Si(100)" in Semiconductor-and Photo-Electrochemistry, Joint International Meeting: 200^th ECS meeting and the 52^nd ISE meeting, San Francisco, September 2001.

L. Santinacci, T. Djenizian and P. Schmuki

"AFM Induced Nanoscale Electrochemical Deposition of Metals on Si (100) Surfaces" in Electrochemical Deposition and Dissolution, Joint International Meeting: 200^th ECS meeting and the 52^nd ISE meeting, San Francisco, September 2001.

L. Santinacci, T. Djenizian and P. Schmuki

"Selective Pd Electrochemical Deposition on Si (100) Surfaces Assisted by AFM" in Interfacial Structure, Kinetics, and Electrocatalysis, Joint International Meeting: 200^th ECS meeting and the 52^nd ISE meeting, San Francisco, September 2001.

L. Santinacci, T. Djenizian and P. Schmuki
"A novel Semiconductor Nano-Patterning Approach Using AFM-Scratching Through Thin Oxide Layers" in Semiconductor-and Photo-Electrochemistry, Joint International Meeting. 200^th ECS meeting and 52^nd ISE meeting, San Francisco, September 2001.

T. Djenizian, L. Santinacci and P. Schmuki

"E-beam induced nano-masking for metal electrodeposition on semiconductor surfaces" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, P. Schmuki, Editor, PV 2000-25, p. 200, The Electrochemical Society Proceedings Series, Pennington, NJ (2001).

L. Santinacci, T. Djenizian and P. Schmuki

"AFM induced nano-patterning of Si surfaces" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, P. Schmuki, Editor, PV 2000-25, p. 189, The Electrochemical Society Proceedings Series, Pennington, NJ (2001).

P. Schmuki, L. Santinacci, T. Djenizian and D.J. Lockwood

"Formation and properties of porous InP" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, P. Schmuki, Editor, PV 2000-25, p. 554, The Electrochemical Society Proceedings Series, Pennington, NJ (2001).

D.J. Lockwood, L. Santinacci, T. Djenizian and P. Schmuki

"Optical properties of InP" in 2^nd International Symposium on Pits and Pores: Properties and Significance for Advanced Materials, P. Schmuki, Editor, PV 2000-25, p. 567, The Electrochemical Society Proceedings Series, Pennington, NJ (2001).

T. Djenizian, L. Santinacci and P. Schmuki

"Electron beam induced carbon masking for selective porous silicon formation" in 6^th International symposium on the physics and chemistry of luminescent materials, M. Cahay, Editor, PV 2001, The Electrochemical Society Proceedings Series, Pennington, NJ (2001).

P. Schmuki, L. Santinacci, T. Djenizian and D.J. Lockwood

"Pore formation on n-InP", Phys. Stat. Sol. A, 182, 51 (2000).

T. Djenizian, L. Santinacci and P. Schmuki

"Electron-beam induced nanomasking for metal electrodeposition on semiconductor surfaces", J. Electrochem. Soc., 148, 197(2001).

T. Djenizian, L. Santinacci and P. Schmuki

"Electron beam-induced carbon masking for electrodeposition on semiconductor surfaces", Appl. Phys. Lett., 78, 2940 (2001).

L. Santinacci, T. Djenizian and P. Schmuki

"AFM induced nano-patterning of Si surfaces", J. Electrochem. Soc., 148, 640 (2001).

L. Santinacci, T. Djenizian and P. Schmuki

"Nanoscale patterning of Si(100) surfaces by scratching through the native oxide layer using atomic force microscope", Appl. Phys Lett., 79, 1882(2001).

T. Djenizian, B. Petite, L. Santinacci and P. Schmuki

"Electron-beam induced carbon deposition used as mask for cadmium sulfide deposition", Electrochim. Acta, (2001), in press.

T. Djenizian, G. I. Sproule, S. Meisa, D. Landheer, X. Wu, L. Santinacci, P. Schmuki and M. J. Graham
"Composition and growth of thin anodic oxides formed on InP (100)", Electrochim. Acta, submitted.

T. Djenizian, L. Santinacci and P. Schmuki

"Electron Beam Induced Carbon Deposition Used as a Negative Resist for Selective Porous Silicon Formation", J. Electrochem. Soc., (2001), submitted.

T. Djenizian, L. Achour, L. Santinacci, H. Hildebrand and P. Schmuki

"Electron-beam induced carbon mask effect for electrochemical reactions, nanostructures fabrication", Electrochim. Acta, (2001), submitted.

L. Santinacci, T. Djenizian, H. Hildegrand, S. Ecoffey, H. Mokdad, T. Campanella and P. Schmuki

"Selective palladium electrochemical deposition on silicon (100) surfaces by AFM oxide scratching", Electrochim. Acta, submitted.

Report from the scientific on-line journal "Inside R&D Alert" about sub-100-nm technology for device fabrication

T. Djenizian, L. Santinacci and P. Schmuki

"Sub-100 nm mask is repairable", Frost & Sullivan, New York, June 8 (2001).